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Design method for an off-axis reflective anamorphic optical system with aberration balance and constraint control 期刊论文
Applied Optics, 2021, 卷号: 60, 期号: 16, 页码: 4557-4566
作者:  Y. Wu;  L. Wang;  X. Zhang;  J. Yu;  B. Yu and C. Jin
浏览  |  Adobe PDF(8010Kb)  |  收藏  |  浏览/下载：92/38  |  提交时间：2022/06/13
Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers 期刊论文
Guangxue Xuebao/Acta Optica Sinica, 2020, 卷号: 40, 期号: 10, 页码: 7
作者:  S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng
浏览  |  Adobe PDF(2105Kb)  |  收藏  |  浏览/下载：139/73  |  提交时间：2021/07/06
Mo/Si multilayers sputtered onto inclined substrates: experiments and simulations 期刊论文
Optics Express, 2020, 卷号: 28, 期号: 9, 页码: 13516-13531
作者:  S. Z. Sun,B. Yu,G. Tao,S. Yao,Y. Liu,W. Y. Deng,C. Li and C. S. Jin
浏览  |  Adobe PDF(3158Kb)  |  收藏  |  浏览/下载：78/22  |  提交时间：2021/07/06
Plasma-ion-assisted deposition of HfO2 films with low UV absorption 期刊论文
Surface & Coatings Technology, 2020, 卷号: 395, 页码: 12
作者:  W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu
浏览  |  Adobe PDF(1924Kb)  |  收藏  |  浏览/下载：126/48  |  提交时间：2021/07/06
Reflection and Resputtering of Mo/Si Atoms During High-Energy Deposition 期刊论文
Guangxue Xuebao/Acta Optica Sinica, 2020, 卷号: 40, 期号: 11, 页码: 8
作者:  S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng
浏览  |  Adobe PDF(3802Kb)  |  收藏  |  浏览/下载：125/47  |  提交时间：2021/07/06
Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view 期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 32, 页码: 10185-10193
作者:  Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin
浏览  |  Adobe PDF(4372Kb)  |  收藏  |  浏览/下载：131/60  |  提交时间：2021/07/06
Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
浏览  |  Adobe PDF(1006Kb)  |  收藏  |  浏览/下载：290/104  |  提交时间：2018/06/13
Design and fabrication of broadband Mo/Si multilayer films for extreme ultra violet lithography illumination system 期刊论文
Zhongguo Jiguang/Chinese Journal of Lasers, 2016, 卷号: 43, 期号: 4
作者:  Yu, B.;  C. Li;  C. Jin and C. Wang
浏览  |  Adobe PDF(1342Kb)  |  收藏  |  浏览/下载：323/64  |  提交时间：2017/09/11