Plasma-ion-assisted deposition of HfO2 films with low UV absorption

doi:10.1016/j.surfcoat.2020.125691

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	Plasma-ion-assisted deposition of HfO2 films with low UV absorption
	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu
	2020
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	395 页码:12
摘要	HfO2 films were fabricated by plasma-ion-assisted deposition of electron beam evaporation (PIAD-EBE) for low absorption applications in UV. The optical, structural and composition properties of the deposited HfO2 films were systematically investigated to evaluate the influence and its mechanism of four kind process parameters. The results revealed that the crystal orientation of the monoclinic phase in the HfO2 films was very sensitive to momentum transfer originating from the plasma ions or the substrate temperature. Besides, the evolution of the crystal orientation with momentum transfer showed a strong correlation with the refractive index and its inhomogeneity in the HfO2 films. An optimized HfO2 film with very low extinction coefficients and high refractive index, which was critical to UV applications such as HR mirrors and solar-blind filters, was obtained.
DOI	10.1016/j.surfcoat.2020.125691
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收录类别	SCI ; EI
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/64793
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu. Plasma-ion-assisted deposition of HfO2 films with low UV absorption[J]. Surface & Coatings Technology,2020,395:12.
APA	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu.(2020).Plasma-ion-assisted deposition of HfO2 films with low UV absorption.Surface & Coatings Technology,395,12.
MLA	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu."Plasma-ion-assisted deposition of HfO2 films with low UV absorption".Surface & Coatings Technology 395(2020):12.

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