Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers

doi:10.3788/AOS202040.1031002

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	Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers
	S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng
	2020
发表期刊	Guangxue Xuebao/Acta Optica Sinica
ISSN	2532239
卷号	40 期号:10 页码:7
摘要	Mo/Si multilayer coating process is one of the key technologies for extreme ultraviolet lithography. In order to optimize the coating process of Mo/Si multilayers, we study the influences of environment pressure and target-substrate distance on the surface roughness of Mo/Si multilayer coating. A model of atomic deposition is established based on the physical process of magnetron sputtering. The variations of incident angle and the energy distribution of depositing atoms with environment pressure and target-substrate distance are investigated. Moreover, the experiments are performed to fabricate Mo/Si multilayer coating samples using a direct current magnetron sputtering coating machine, and the evolutions of the surface roughness and power spectral density with environment pressure and target-substrate distance are studied. The conclusion obtained from the model agrees well with that from the experiments, and the proposed model can provide a theoretical explanation for the results measured by the experiments. 2020, Chinese Lasers Press. All right reserved.
DOI	10.3788/AOS202040.1031002
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收录类别	EI
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文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/64850
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng. Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers[J]. Guangxue Xuebao/Acta Optica Sinica,2020,40(10):7.
APA	S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng.(2020).Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers.Guangxue Xuebao/Acta Optica Sinica,40(10),7.
MLA	S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng."Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers".Guangxue Xuebao/Acta Optica Sinica 40.10(2020):7.

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