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Signal-to-noise ratio enhancement of a Hadamard transform spectrometer using a two-dimensional slit-array 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 25
作者:  Chi, M. B.;  Y. H. Wu;  F. Qian;  P. Hao;  W. C. Zhou and Y. S. Liu
浏览  |  Adobe PDF(699Kb)  |  收藏  |  浏览/下载:336/106  |  提交时间:2018/06/08
An Automatic Corona-discharge Detection System for Railways Based on Solar-blind Ultraviolet Detection 期刊论文
Current Optics and Photonics, 2017, 卷号: 1, 期号: 3
作者:  Li, J. Q.;  Y. Zhou;  X. Y. Yi;  M. C. Zhang;  X. Chen;  M. H. Cui and F. Yan
浏览  |  Adobe PDF(1418Kb)  |  收藏  |  浏览/下载:322/99  |  提交时间:2018/06/13
Experimental Demonstration of Amplified Feedback DFB Laser With Modulation Bandwidth Enhancement Based on the Reconstruction Equivalent Chirp Technique 期刊论文
Ieee Photonics Journal, 2017, 卷号: 9, 期号: 6
作者:  Zheng, J. L.;  G. W. Zhao;  Y. T. Zhou;  Z. K. Zhang;  T. Pu;  Y. C. Shi;  Y. S. Zhang;  Y. Liu;  L. Y. Li;  J. Lu;  X. Zhang;  J. Li;  Y. Zhou and X. F. Chen
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Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography 期刊论文
Applied Surface Science, 2017, 卷号: 425
作者:  Xue, C. F.;  J. Zhao;  Y. Q. Wu;  H. N. Yu;  S. M. Yang;  L. S. Wang;  W. C. Zhao;  Q. Wu;  Z. C. Zhu;  B. Liu;  X. Zhang;  W. C. Zhou and R. Z. Tai
浏览  |  Adobe PDF(1187Kb)  |  收藏  |  浏览/下载:340/96  |  提交时间:2018/06/13
Highly dispersed few-layer MoS2 nanosheets on S, N co-doped carbon for electrocatalytic H-2 production 期刊论文
Chinese Journal of Catalysis, 2017, 卷号: 38, 期号: 6
作者:  Hua, S. X.;  D. Qu;  L. An;  G. C. Xi;  G. Chen;  F. Li;  Z. J. Zhou and Z. C. Sun
Adobe PDF(2094Kb)  |  收藏  |  浏览/下载:268/25  |  提交时间:2018/06/13
Hybrid-level Fresnel zone plate for diffraction efficiency enhancement 期刊论文
Optics Express, 2017, 卷号: 25, 期号: 26
作者:  Zhang, Z.;  C. Guo;  R. Wang;  H. Hu;  X. Zhou;  T. Liu;  D. Xue;  X. Zhang;  F. Zhang and X. Zhang
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Mitigating effect on turbulent scintillation using non-coherent multi-beam overlapped illumination 期刊论文
Optics and Laser Technology, 2017, 卷号: 97
作者:  Zhou, L.;  Y. Z. Tian;  R. Wang;  T. F. Wang;  T. Sun;  C. J. Wang and X. T. Yang
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Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
浏览  |  Adobe PDF(1006Kb)  |  收藏  |  浏览/下载:293/104  |  提交时间:2018/06/13