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Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
Xue, C. F.; J. Zhao; Y. Q. Wu; H. N. Yu; S. M. Yang; L. S. Wang; W. C. Zhao; Q. Wu; Z. C. Zhu; B. Liu; X. Zhang; W. C. Zhou and R. Z. Tai
2017
发表期刊Applied Surface Science
卷号425
摘要Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved.
收录类别sci ; ei
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/59361
专题中科院长春光机所知识产出
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Xue, C. F.,J. Zhao,Y. Q. Wu,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. Applied Surface Science,2017,425.
APA Xue, C. F..,J. Zhao.,Y. Q. Wu.,H. N. Yu.,S. M. Yang.,...&W. C. Zhou and R. Z. Tai.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.Applied Surface Science,425.
MLA Xue, C. F.,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".Applied Surface Science 425(2017).
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