中文版 | English

在结果中检索

CIOMP OpenIR

浏览/检索结果: 共15条，第1-10条 帮助

限定条件        
已选(0)清除 条数/页：   排序方式：
Wavelength stabilization and spectra narrowing of a 405 nm external-cavity semiconductor laser based on a volume Bragg grating 期刊论文
Applied Optics, 2022, 卷号: 61, 期号: 14, 页码: 4132-4139
作者:  Y. Liu;  Y. Liu;  H. L. Li;  H. D. Xiao;  Y. K. Xia;  R. H. Gao;  X. Li and Q. Zheng
浏览  |  Adobe PDF(4930Kb)  |  收藏  |  浏览/下载：155/62  |  提交时间：2023/06/14
High-order DBR semiconductor lasers: effect of grating parameters on grating performance 期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 28, 页码: 8789-8792
作者:  E. Siyu,Y. L. Zhou,X. Zhang,J. W. Zhang,Y. W. Huang,Y. G. Zeng,J. J. Cui,Y. Liu,Y. Q. Ning and L. J. Wang
浏览  |  Adobe PDF(1602Kb)  |  收藏  |  浏览/下载：113/37  |  提交时间：2021/07/06
Practical two-dimensional beam steering system using an integrated tunable laser and an optical phased array 期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 32, 页码: 9985-9994
作者:  W. C. Ma,S. Tan,K. K. Wang,W. H. Guo,Y. Liu,L. G. Liao,L. G. Zhou,J. Zhou,X. Li,L. Liang and W. Z. Li
浏览  |  Adobe PDF(23609Kb)  |  收藏  |  浏览/下载：138/33  |  提交时间：2021/07/06
Heterodyne period measurement in a scanning beam interference lithography system 期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 19, 页码: 5830-5836
作者:  S. Jiang,B. Lu,Y. Song,Z. W. Liu,W. Wang,L. Shuo and Bayanheshig
浏览  |  Adobe PDF(1356Kb)  |  收藏  |  浏览/下载：122/36  |  提交时间：2021/07/06
Non-uniformity correction of polarization response for liquid crystal modulated polarimeters 期刊论文
Applied Optics, 2019, 卷号: 58, 期号: 32, 页码: 8829-8838
作者:  Y.X.Zhang;  B.Zhang;  Y.F.Hong;  W.D.Wu;  F.Xu
浏览  |  Adobe PDF(1955Kb)  |  收藏  |  浏览/下载：116/40  |  提交时间：2020/08/24
imaging polarimeter,phase modulators,calibration,division,Optics  
996 nm high-power single-longitudinal-mode tapered gain-coupled distributed feedback laser diodes 期刊论文
Applied Optics, 2019, 卷号: 58, 期号: 23, 页码: 6426-6432
作者:  Y.X.Lei;  Y.Y.Chen;  F.Gao;  D.Z.Ma;  P.Jia;  H.Wu;  C.K.Ruan
浏览  |  Adobe PDF(1060Kb)  |  收藏  |  浏览/下载：214/53  |  提交时间：2020/08/24
dfb lasers,semiconductor-laser,linewidth,Optics  
Weighted iterative algorithm for beam alignment in scanning beam interference lithography 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 31
作者:  Song, Y.;  W. Wang;  S. Jiang;  Bayanheshig and N. Zhang
浏览  |  Adobe PDF(1461Kb)  |  收藏  |  浏览/下载：232/68  |  提交时间：2018/06/13
Correcting groove error in gratings ruled on a 500-mm ruling engine using interferometric control 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 21
作者:  Mi, X. T.;  H. L. Yu;  H. Z. Yu;  S. W. Zhang;  X. T. Li;  X. F. Yao;  X. D. Qi;  Bayinhedhig and Q. H. Wan
浏览  |  Adobe PDF(2137Kb)  |  收藏  |  浏览/下载：352/119  |  提交时间：2018/06/13
Beam drift error and control technology for scanning beam interference lithography 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 14
作者:  Wang, W.;  Y. Song;  S. Jiang;  M. Z. Pan and Bayanheshing
浏览  |  Adobe PDF(1710Kb)  |  收藏  |  浏览/下载：262/74  |  提交时间：2018/06/13
Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
浏览  |  Adobe PDF(1006Kb)  |  收藏  |  浏览/下载：291/104  |  提交时间：2018/06/13