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Speckle pattern sequential extraction metric for estimating the focus spot size on a remote diffuse target 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 32
作者:  Yu, Z.;  Y. Y. Li;  L. S. Liu;  J. Guo;  T. F. Wang and G. Q. Yang
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Optical system design of an atmospheric detector with nadir view and omnidirectional limb view 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Wang, X. H. and Q. S. Xue
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Weighted iterative algorithm for beam alignment in scanning beam interference lithography 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 31
作者:  Song, Y.;  W. Wang;  S. Jiang;  Bayanheshig and N. Zhang
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High-precision identification of a tip-tilt control system for the compensation of time delay 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 5
作者:  Wang, Y. K.;  Z. L. Cao;  L. F. Hu;  X. Y. Zhang;  D. Y. Li;  H. Y. Xu;  S. X. Wang;  Q. Q. Mu and L. Xuan
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Detecting wavefront amplitude and phase using linear phase diversity 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 22
作者:  Zhang, D.;  S. Y. Xu;  N. N. Liu and X. Y. Wang
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Beam drift error and control technology for scanning beam interference lithography 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 14
作者:  Wang, W.;  Y. Song;  S. Jiang;  M. Z. Pan and Bayanheshing
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Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
Adobe PDF(1006Kb)  |  收藏  |  浏览/下载:292/104  |  提交时间:2018/06/13