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Research on scattering models of air particles with variable size distribution and shape distribution 期刊论文
Applied Optics, 2019, 卷号: 58, 期号: 13, 页码: 3370-3378
作者:  Z.R.Cao;  H.B.Jiang
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light-scattering,mueller matrix,polarization,Optics  
Optical system design of an atmospheric detector with nadir view and omnidirectional limb view 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Wang, X. H. and Q. S. Xue
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Weighted iterative algorithm for beam alignment in scanning beam interference lithography 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 31
作者:  Song, Y.;  W. Wang;  S. Jiang;  Bayanheshig and N. Zhang
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Elimination of the field-dependent aberrations of the JWST-like space telescopes in the multi-field fine-phasing process 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 10
作者:  Ju, G. H.;  C. X. Yan and Z. Y. Gu
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Methods of polarimetric calibration and reconstruction for a fieldable channeled dispersive imaging spectropolarimeter 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 30
作者:  Yang, B.;  J. Q. Zhang;  C. X. Yan and X. P. Ju
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Generation of coherent and incoherent Airy beam arrays and experimental comparisons of their scintillation characteristics in atmospheric turbulence 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 13
作者:  Lu, Q.;  S. J. Gao;  L. Sheng;  J. B. Wu and Y. F. Qiao
Adobe PDF(1183Kb)  |  收藏  |  浏览/下载:273/89  |  提交时间:2018/06/13
Improved generation method utilizing a modified Fourier spectrum for Airy beams with the phase-only filter technique 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 25
作者:  Ling, J. Y.;  Q. Y. Yang;  S. X. Zhang;  Q. Lu;  S. Liu and C. Z. Guo
Adobe PDF(1463Kb)  |  收藏  |  浏览/下载:231/49  |  提交时间:2018/06/13
High-performance laser projection display illumination system based on a diffractive optical element 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 10
作者:  Liang, C. Y.;  W. Zhang;  D. W. Rui;  Y. X. Sui and H. J. Yang
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Relationship analysis between transient thermal control mode and image quality for an aerial camera 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 4
作者:  Liu, W. Y.;  Y. S. Xu;  Y. Yao;  Y. L. Xu;  H. H. Shen and Y. L. Ding
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Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
浏览  |  Adobe PDF(1006Kb)  |  收藏  |  浏览/下载:288/103  |  提交时间:2018/06/13