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Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
浏览  |  Adobe PDF(1006Kb)  |  收藏  |  浏览/下载：292/104  |  提交时间：2018/06/13
Design and fabrication of broadband Mo/Si multilayer films for extreme ultra violet lithography illumination system 期刊论文
Zhongguo Jiguang/Chinese Journal of Lasers, 2016, 卷号: 43, 期号: 4
作者:  Yu, B.;  C. Li;  C. Jin and C. Wang
浏览  |  Adobe PDF(1342Kb)  |  收藏  |  浏览/下载：330/66  |  提交时间：2017/09/11