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| Field diversity phase retrieval method for wavefront sensing in monolithic mirror space telescopes 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 15 作者: Ju, G. H.; C. X. Yan; D. Yue and Z. Y. Gu Adobe PDF(999Kb)  |  收藏  |  浏览/下载:303/93  |  提交时间:2018/06/13 |
| Reduction of the effects of angle errors for a channeled spectropolarimeter 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 33 作者: Ju, X. P.; B. Yang; J. Q. Zhang and C. X. Yan Adobe PDF(1787Kb)  |  收藏  |  浏览/下载:266/84  |  提交时间:2018/06/13 |
| Correcting groove error in gratings ruled on a 500-mm ruling engine using interferometric control 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 21 作者: Mi, X. T.; H. L. Yu; H. Z. Yu; S. W. Zhang; X. T. Li; X. F. Yao; X. D. Qi; Bayinhedhig and Q. H. Wan Adobe PDF(2137Kb)  |  收藏  |  浏览/下载:356/120  |  提交时间:2018/06/13 |
| Positive dwell time algorithm with minimum equal extra material removal in deterministic optical surfacing technology 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 32 作者: Li, L. X.; D. L. Xue; W. J. Deng; X. Wang; Y. Bai; F. Zhang and X. J. Zhang Adobe PDF(927Kb)  |  收藏  |  浏览/下载:273/73  |  提交时间:2018/06/13 |
| Absolute detector-based spectrally tunable radiant source using digital micromirror device and supercontinuum fiber laser 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 17 作者: Li, Z. G.; X. X. Wang; Y. Q. Zheng and F. T. Li Adobe PDF(1094Kb)  |  收藏  |  浏览/下载:245/78  |  提交时间:2018/06/13 |
| Design and optimization for main support structure of a large-area off-axis three-mirror space camera 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 4 作者: Wei, L.; L. Zhang; X. X. Gong and D. M. Ma Adobe PDF(1749Kb)  |  收藏  |  浏览/下载:274/85  |  提交时间:2018/06/13 |
| Beam drift error and control technology for scanning beam interference lithography 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 14 作者: Wang, W.; Y. Song; S. Jiang; M. Z. Pan and Bayanheshing Adobe PDF(1710Kb)  |  收藏  |  浏览/下载:266/75  |  提交时间:2018/06/13 |
| High-performance laser projection display illumination system based on a diffractive optical element 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 10 作者: Liang, C. Y.; W. Zhang; D. W. Rui; Y. X. Sui and H. J. Yang Adobe PDF(1070Kb)  |  收藏  |  浏览/下载:330/100  |  提交时间:2018/06/13 |
| Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文 Applied Optics, 2017, 卷号: 56, 期号: 26 作者: Yu, B.; C. S. Jin; S. Yao; C. Li; Y. Liu; F. Zhou; B. Y. Guo; H. Wang; Y. Xie and L. P. Wang Adobe PDF(1006Kb)  |  收藏  |  浏览/下载:292/104  |  提交时间:2018/06/13 |