Changchun Institute of Optics,Fine Mechanics and Physics,CAS
ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4 | |
其他题名 | 论文其他题名 |
Wang K. M.; Ding P. J.; Wang W.; Lanford W. A.; Li Y.; Li J. S.; Liu Y. G. | |
1994 | |
发表期刊 | Applied Physics Letters |
ISSN | 0003-6951 |
卷号 | 64期号:23页码:3101-3103 |
摘要 | 400 keV Yb+ and 300 keV Er+ were implanted into potassium titanyl phosphate (KTiOPO4 or KTP) with doses of 3 x 10(15) and 1 X 10(15) ions/cm2, respectively. The samples were annealed in the temperature range 600 to 800-degrees-C in Ar ambient. The diffusion behaviors of implanted Yb+ and Er+ in KTiOPO4 were investigated by Rutherford backscattering of 2.0 MeV He ions. The results show that no obvious diffusion of Yb+ and Er+ in KTiOPO4 is detected at 600-degrees-C annealing, but there are three and two peaks of implanted rare-earth ion distribution after 800-degrees-C annealing for the case of Yb+ and Er+, respectively. An explanation of these phenomena is suggested. |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:A1994NP75200013 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25480 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Wang K. M.,Ding P. J.,Wang W.,et al. ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4[J]. Applied Physics Letters,1994,64(23):3101-3103. |
APA | Wang K. M..,Ding P. J..,Wang W..,Lanford W. A..,Li Y..,...&Liu Y. G..(1994).ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4.Applied Physics Letters,64(23),3101-3103. |
MLA | Wang K. M.,et al."ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4".Applied Physics Letters 64.23(1994):3101-3103. |
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