ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4

	ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4
其他题名	论文其他题名
	Wang K. M.; Ding P. J.; Wang W.; Lanford W. A.; Li Y.; Li J. S.; Liu Y. G.
	1994
发表期刊	Applied Physics Letters
ISSN	0003-6951
卷号	64 期号:23 页码:3101-3103
摘要	400 keV Yb+ and 300 keV Er+ were implanted into potassium titanyl phosphate (KTiOPO4 or KTP) with doses of 3 x 10(15) and 1 X 10(15) ions/cm2, respectively. The samples were annealed in the temperature range 600 to 800-degrees-C in Ar ambient. The diffusion behaviors of implanted Yb+ and Er+ in KTiOPO4 were investigated by Rutherford backscattering of 2.0 MeV He ions. The results show that no obvious diffusion of Yb+ and Er+ in KTiOPO4 is detected at 600-degrees-C annealing, but there are three and two peaks of implanted rare-earth ion distribution after 800-degrees-C annealing for the case of Yb+ and Er+, respectively. An explanation of these phenomena is suggested.
收录类别	SCI
语种	英语
WOS记录号	WOS:A1994NP75200013
引用统计	被引频次：8[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25480
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang K. M.,Ding P. J.,Wang W.,et al. ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4[J]. Applied Physics Letters,1994,64(23):3101-3103.
APA	Wang K. M..,Ding P. J..,Wang W..,Lanford W. A..,Li Y..,...&Liu Y. G..(1994).ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4.Applied Physics Letters,64(23),3101-3103.
MLA	Wang K. M.,et al."ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4".Applied Physics Letters 64.23(1994):3101-3103.

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