Plasmonic Nanolithography: A Review

	Plasmonic Nanolithography: A Review
其他题名	论文其他题名
	Xie Z. H.; Yu W. X.; Wang T. S.; Zhang H. X.; Fu Y. Q.; Liu H.; Li F. Y.; Lu Z. W.; Sun Q.
	2011
发表期刊	Plasmonics
ISSN	1557-1955
卷号	6 期号:3 页码:565-580
摘要	Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/24722
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Xie Z. H.,Yu W. X.,Wang T. S.,et al. Plasmonic Nanolithography: A Review[J]. Plasmonics,2011,6(3):565-580.
APA	Xie Z. H..,Yu W. X..,Wang T. S..,Zhang H. X..,Fu Y. Q..,...&Sun Q..(2011).Plasmonic Nanolithography: A Review.Plasmonics,6(3),565-580.
MLA	Xie Z. H.,et al."Plasmonic Nanolithography: A Review".Plasmonics 6.3(2011):565-580.

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