中文版 | English

在结果中检索

CIOMP OpenIR

浏览/检索结果: 共5条，第1-5条 帮助

限定条件        
已选(0)清除 条数/页：   排序方式：
Methods of polarimetric calibration and reconstruction for a fieldable channeled dispersive imaging spectropolarimeter 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 30
作者:  Yang, B.;  J. Q. Zhang;  C. X. Yan and X. P. Ju
浏览  |  Adobe PDF(2168Kb)  |  收藏  |  浏览/下载：266/69  |  提交时间：2018/06/13
Positive dwell time algorithm with minimum equal extra material removal in deterministic optical surfacing technology 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 32
作者:  Li, L. X.;  D. L. Xue;  W. J. Deng;  X. Wang;  Y. Bai;  F. Zhang and X. J. Zhang
浏览  |  Adobe PDF(927Kb)  |  收藏  |  浏览/下载：270/73  |  提交时间：2018/06/13
Design and optimization for main support structure of a large-area off-axis three-mirror space camera 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 4
作者:  Wei, L.;  L. Zhang;  X. X. Gong and D. M. Ma
浏览  |  Adobe PDF(1749Kb)  |  收藏  |  浏览/下载：262/75  |  提交时间：2018/06/13
Relationship analysis between transient thermal control mode and image quality for an aerial camera 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 4
作者:  Liu, W. Y.;  Y. S. Xu;  Y. Yao;  Y. L. Xu;  H. H. Shen and Y. L. Ding
浏览  |  Adobe PDF(1318Kb)  |  收藏  |  浏览/下载：247/85  |  提交时间：2018/06/13
Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
浏览  |  Adobe PDF(1006Kb)  |  收藏  |  浏览/下载：288/103  |  提交时间：2018/06/13