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Analysis and correction of the distortion error in a DMD based scanning lithography system 期刊论文
Optics Communications, 2019, 卷号: 434, 页码: 1-6
作者:  Q.K.Li;  Y.Xiao;  H.Liu;  H.L.Zhang;  J.Xu;  J.H.Li
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Microlithography,Lithography,Digital image processing,maskless lithography,fabrication,Optics