Analysis and correction of the distortion error in a DMD based scanning lithography system

doi:10.1016/j.optcom.2018.10.042

CIOMP OpenIR

	Analysis and correction of the distortion error in a DMD based scanning lithography system
	Q.K.Li; Y.Xiao; H.Liu; H.L.Zhang; J.Xu; J.H.Li
	2019
发表期刊	Optics Communications
ISSN	0030-4018
卷号	434 页码:1-6
摘要	DMD based lithography system provides the feasibility to achieve multi-point parallel direct writing exposure. However, the distortion of the projection lens in a scanning lithography system not only deviates the vertical size (vertical to the scanning direction), but also deviates the center position of an accumulated exposure point from the ideal one. In this work, we report a simple and realizable imaging compensation method, demonstrate as a combination of changing the magnification of the projection lens with loading an appropriately designed mask on DMD to eliminate the effects induced by distortion. With this method, the maximum center deviation of the accumulated exposure point is reduced from 4.3 mu m to 1.45 mu m, and the maximum size error is reduced from 0.4 mu m to 0.1 mu m with a 0.03% distortion projection lens in simulation. Moreover, we demonstrated the feasibility and effectiveness of the method experimentally by fabricating gratings with high geometry quality in large areas. Therefore, such simple method may have practical significance for improving the lithography quality of DMD-based system.
关键词	Microlithography,Lithography,Digital image processing,maskless lithography,fabrication,Optics
DOI	10.1016/j.optcom.2018.10.042
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收录类别	SCI ; EI
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/63254
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Q.K.Li,Y.Xiao,H.Liu,et al. Analysis and correction of the distortion error in a DMD based scanning lithography system[J]. Optics Communications,2019,434:1-6.
APA	Q.K.Li,Y.Xiao,H.Liu,H.L.Zhang,J.Xu,&J.H.Li.(2019).Analysis and correction of the distortion error in a DMD based scanning lithography system.Optics Communications,434,1-6.
MLA	Q.K.Li,et al."Analysis and correction of the distortion error in a DMD based scanning lithography system".Optics Communications 434(2019):1-6.

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