Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Wavefront measurements using the Ronchi test for high-NA lithography projection lenses | |
X. Yu and J. Li | |
2023 | |
发表期刊 | Applied Optics
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ISSN | 1559128X |
卷号 | 62期号:19页码:5057-5063 |
摘要 | The Ronchi test is widely used for wavefront measurements in advanced lithography tools, and a physical optics explanation of the Ronchi test based on scalar diffraction theory can be found in numerous publications.However, for high-numerical aperture (high-NA) lithography projection lenses, the vector nature of light should be considered when performing wavefront measurements, especially the effect of polarization aberrations on the wavefront test results. In this paper, a vector model for describing shearing interferometry for high-NA lithography projection lenses is established. In addition to considering the vector nature of light, the vector model also calculates the Ronchigram on the screen of a detector at any distance from a diffraction grating, as opposed to the distance restriction for the Fraunhofer diffraction approximation used by the existing methods. Using the developed mathematical model of theRonchi test, theRonchigrams of high-NA lithography projection lenses under non-polarized illumination are simulated, and the effect of the distance between the diffraction grating and the detection screen on the wavefront measurement accuracy are discussed. ©2023 Optica Publishing Group. |
DOI | 10.1364/AO.488608 |
URL | 查看原文 |
收录类别 | sci ; ei |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/68123 |
专题 | 中国科学院长春光学精密机械与物理研究所 |
推荐引用方式 GB/T 7714 | X. Yu and J. Li. Wavefront measurements using the Ronchi test for high-NA lithography projection lenses[J]. Applied Optics,2023,62(19):5057-5063. |
APA | X. Yu and J. Li.(2023).Wavefront measurements using the Ronchi test for high-NA lithography projection lenses.Applied Optics,62(19),5057-5063. |
MLA | X. Yu and J. Li."Wavefront measurements using the Ronchi test for high-NA lithography projection lenses".Applied Optics 62.19(2023):5057-5063. |
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