Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films

doi:10.3390/coatings13020368

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	Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films
	Y. Wang, T. Gehring, Q. H. Jin, J. Dycke and R. Kling
	2023
发表期刊	Coatings
卷号	13 期号:2 页码:14
摘要	Inductively coupled plasma with an argon/hydrogen (Ar/H-2) mixture is a potential solution to many surface treatment problems, especially when encountering carbon contamination in optical X-ray and extreme ultraviolet instruments. Removing carbon contamination on multilayer thin films with Ar/H-2 plasma extends the lifetime of the above devices. To further investigate the reaction between plasma and carbon, both optical emission spectroscopy and finite element method with multiphysics fields were employed. The results demonstrated that the intensities of the Balmer lines were in good agreement with the densities of the radical hydrogen atoms from the simulation model, showing a dependence on the mixing ratio. At an electrical input power of 165 W and a total pressure of 5 Pa, an optimum mixing ratio of about 35 +/- 5 % hydrogen produced the highest density of hydrogen radicals, coinciding with the highest carbon removal rate. This shows that the carbon removal with Ar/H-2 plasma was mainly controlled by the density of hydrogen radicals, and the mixing ratio showed a significant impact on the removal rates.
DOI	10.3390/coatings13020368
URL	查看原文
收录类别	sci
语种	英语
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/67987
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Y. Wang, T. Gehring, Q. H. Jin, J. Dycke and R. Kling. Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films[J]. Coatings,2023,13(2):14.
APA	Y. Wang, T. Gehring, Q. H. Jin, J. Dycke and R. Kling.(2023).Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films.Coatings,13(2),14.
MLA	Y. Wang, T. Gehring, Q. H. Jin, J. Dycke and R. Kling."Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films".Coatings 13.2(2023):14.

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