Active control technology of a diffraction grating wavefront by scanning beam interference lithography

doi:10.1364/OE.437593

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	Active control technology of a diffraction grating wavefront by scanning beam interference lithography
	Z. Liu; H. Yang; Y. Li; S. Jiang; W. Wang; Y. Song and L. W
	2021
发表期刊	Optics Express
ISSN	10944087
卷号	29 期号:23 页码:5
摘要	To fabricate plain holographic gratings with high wavefront quality and to obtain the wavefront required in varied line-space grating, an active control technology of a diffraction grating wavefront by modulating the phase distribution of the scanning-beam interference lithography system was proposed. Sinusoidal wavefront control is simulated, and the controlled wavefront being almost the same as the target wavefront. A photoresist grating was fabricated whose surface is uniform and the wavefront is ideally sinusoidal. The theoretical analysis and experimental results confirmed that the wavefront of the diffraction grating can be actively controlled by modulating the phase distribution of the scanning-beam interference lithography system. 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
DOI	10.1364/OE.437593
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收录类别	SCI ; EI
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/65025
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Z. Liu,H. Yang,Y. Li,et al. Active control technology of a diffraction grating wavefront by scanning beam interference lithography[J]. Optics Express,2021,29(23):5.
APA	Z. Liu,H. Yang,Y. Li,S. Jiang,W. Wang,&Y. Song and L. W.(2021).Active control technology of a diffraction grating wavefront by scanning beam interference lithography.Optics Express,29(23),5.
MLA	Z. Liu,et al."Active control technology of a diffraction grating wavefront by scanning beam interference lithography".Optics Express 29.23(2021):5.

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