Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems

doi:10.3788/col201816.032201

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	Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems
	Zhou, Z. L.; Shang, H. B.; Sui, Y. X.; Yang, H. J.
	2018
发表期刊	Chinese Optics Letters
ISSN	1671-7694
卷号	16 期号:3 页码:5
摘要	Calcium fluoride is widely used in optical lithography lenses and causes retardation that cannot be ignored. However, few studies have been conducted to compensate for the retardation caused by calcium fluoride in optical lithography systems. In this Letter, a new index based on orientation Zernike polynomials is established to describe the value of retardation. Then, a method of retardation compensation is described. The method is implemented by clocking calcium fluoride lens elements, and the optimal rotation angles are calculated using a population-based stochastic optimization algorithm. Finally, an example is provided to validate the method.
关键词	Optics
DOI	10.3788/col201816.032201
收录类别	SCI ; EI
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/61217
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Zhou, Z. L.,Shang, H. B.,Sui, Y. X.,et al. Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems[J]. Chinese Optics Letters,2018,16(3):5.
APA	Zhou, Z. L.,Shang, H. B.,Sui, Y. X.,&Yang, H. J..(2018).Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems.Chinese Optics Letters,16(3),5.
MLA	Zhou, Z. L.,et al."Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems".Chinese Optics Letters 16.3(2018):5.

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