Key technology progress of optomechanical systems in 193 nm projection objective

	Key technology progress of optomechanical systems in 193 nm projection objective
	Zhang, D.; X. Li; D. Rui; P. Li; L. Dong and J. Zhang
	2017
发表期刊	Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica
卷号	47 期号:6
摘要	Combined with double/multiple exposure 193 nm immersion lithography will be the main method of industrial production of large scale integrated circuits in the next 5 to 10 years. As a core subsystem in lithography, research progress of key technologies of the projection objective opto-mechanical systems affects its performance directly. The current demand for 193 nm immersion projection objective in integrated circuit manufacturing is analyzed in the paper. Research status of objective key technologies are elaborated which including exposure system design, lens mount, lens displacement adjustment, active lens, exchangeable elements and numerical aperture (NA) regulation methods. The key scientific issues that hinder the future development of objective lenses are refined. Currently, the mechanism and correction strategy of high-order thermal aberrations need further clarify in 193 nm immersion lithography. The multi-DOF position and orientation calibration problem should be resolved. To guide the manufacture of high image quality objective lenses, an integrated research method of projection objectives should be achieved. 2017, Science Press. All right reserved.
收录类别	ei
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/59418
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Zhang, D.,X. Li,D. Rui,et al. Key technology progress of optomechanical systems in 193 nm projection objective[J]. Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica,2017,47(6).
APA	Zhang, D.,X. Li,D. Rui,P. Li,&L. Dong and J. Zhang.(2017).Key technology progress of optomechanical systems in 193 nm projection objective.Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica,47(6).
MLA	Zhang, D.,et al."Key technology progress of optomechanical systems in 193 nm projection objective".Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica 47.6(2017).

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