CIOMP OpenIR  > 中科院长春光机所知识产出
Key technology progress of optomechanical systems in 193 nm projection objective
Zhang, D.; X. Li; D. Rui; P. Li; L. Dong and J. Zhang
2017
发表期刊Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica
卷号47期号:6
摘要Combined with double/multiple exposure 193 nm immersion lithography will be the main method of industrial production of large scale integrated circuits in the next 5 to 10 years. As a core subsystem in lithography, research progress of key technologies of the projection objective opto-mechanical systems affects its performance directly. The current demand for 193 nm immersion projection objective in integrated circuit manufacturing is analyzed in the paper. Research status of objective key technologies are elaborated which including exposure system design, lens mount, lens displacement adjustment, active lens, exchangeable elements and numerical aperture (NA) regulation methods. The key scientific issues that hinder the future development of objective lenses are refined. Currently, the mechanism and correction strategy of high-order thermal aberrations need further clarify in 193 nm immersion lithography. The multi-DOF position and orientation calibration problem should be resolved. To guide the manufacture of high image quality objective lenses, an integrated research method of projection objectives should be achieved. 2017, Science Press. All right reserved.
收录类别ei
语种中文
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/59418
专题中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Zhang, D.,X. Li,D. Rui,et al. Key technology progress of optomechanical systems in 193 nm projection objective[J]. Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica,2017,47(6).
APA Zhang, D.,X. Li,D. Rui,P. Li,&L. Dong and J. Zhang.(2017).Key technology progress of optomechanical systems in 193 nm projection objective.Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica,47(6).
MLA Zhang, D.,et al."Key technology progress of optomechanical systems in 193 nm projection objective".Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica 47.6(2017).
条目包含的文件 下载所有文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
Key technology progr(2036KB)期刊论文作者接受稿开放获取CC BY-NC-SA浏览 下载
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Zhang, D.]的文章
[X. Li]的文章
[D. Rui]的文章
百度学术
百度学术中相似的文章
[Zhang, D.]的文章
[X. Li]的文章
[D. Rui]的文章
必应学术
必应学术中相似的文章
[Zhang, D.]的文章
[X. Li]的文章
[D. Rui]的文章
相关权益政策
暂无数据
收藏/分享
文件名: Key technology progress of.caj
格式: caj
此文件暂不支持浏览
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。