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Beam drift error and control technology for scanning beam interference lithography
Wang, W.; Y. Song; S. Jiang; M. Z. Pan and Bayanheshing
2017
发表期刊Applied Optics
卷号56期号:14
摘要To improve the quality of grating masks made by scanning beam interference lithography, this article established a mathematical model of step-scanning exposure and analyzed the effects of the beam drift error on the interference image. Beam angle drift can be decomposed into the drift error dx in the exposure plane (XOZ plane) and the drift error delta(y) perpendicular to the plane. Analysis shows that the dx has a major impact on the interference fringes during exposure, which may affect the precision of phase lock. dy leads to the appearance of deflected interference strips and affects the exposure dose. When a low-frequency drift error appears in the light path, the exposure contrast on the photoresist will decrease with the exposure process, which makes the fabrication of large-size diffraction gratings difficult. Furthermore, taking advantage of the characteristics of a scanning beam interference lithography system, an exposed beam stable system was designed that can effectively suppress the low-frequency drift of the beam. The total beam angle control accuracy is better than the 2.7 mu rad, and position control accuracy is better than 3.9 mu m (both for 1 sigma), which achieves the expected goal of the design. (C) 2017 Optical Society of America
收录类别sci ; ei
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/59279
专题中科院长春光机所知识产出
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Wang, W.,Y. Song,S. Jiang,et al. Beam drift error and control technology for scanning beam interference lithography[J]. Applied Optics,2017,56(14).
APA Wang, W.,Y. Song,S. Jiang,&M. Z. Pan and Bayanheshing.(2017).Beam drift error and control technology for scanning beam interference lithography.Applied Optics,56(14).
MLA Wang, W.,et al."Beam drift error and control technology for scanning beam interference lithography".Applied Optics 56.14(2017).
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