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Cleaning of carbon contamination on multilayer optics of EUVL
Song, Y.; Q.-P. Lu; X.-P. Gong; Y. Wang and Z.-Q. Peng
2017
Source PublicationGuangxue Jingmi Gongcheng/Optics and Precision Engineering
Volume25Issue:11
AbstractThis paper focuses on the reflectivity decrease of reflective elements caused by the carbon contamination deposited on multilayers during EUV( Extreme Ultraviolet) lithography working and emphasizes the clear method of carbon contamination deposited on multilayers. The process of carbon contamination deposited on multilayers was elucidated and the damage of carbon contamination on the multilayers was introduced briefly. Several kinds of cleaning methods for carbon contamination deposited on multilayers were described in detail from cleaning mechanism, removing rate and cleaning effect, and their advantages and disadvantages were analyzed. The result indicates that the cleaning rates of plasma oxygen and activated oxygen reach 2 nm/min, but the multilayer surface is easy to be oxidized in cleaning process; and the plasma hydrogen and atomic hydrogen have relatively slow cleaning rates, they are only about 0.37 nm/min, but the multilayer surface is hardly to be oxidized. Moreover, the difficulties of different cleaning methods for X-ray multilayer mirrors in-situ are discussed. 2017, Science Press. All right reserved.
Indexed Byei
Language中文
Document Type期刊论文
Identifierhttp://ir.ciomp.ac.cn/handle/181722/59195
Collection中科院长春光机所知识产出
Recommended Citation
GB/T 7714
Song, Y.,Q.-P. Lu,X.-P. Gong,et al. Cleaning of carbon contamination on multilayer optics of EUVL[J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering,2017,25(11).
APA Song, Y.,Q.-P. Lu,X.-P. Gong,&Y. Wang and Z.-Q. Peng.(2017).Cleaning of carbon contamination on multilayer optics of EUVL.Guangxue Jingmi Gongcheng/Optics and Precision Engineering,25(11).
MLA Song, Y.,et al."Cleaning of carbon contamination on multilayer optics of EUVL".Guangxue Jingmi Gongcheng/Optics and Precision Engineering 25.11(2017).
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