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Cleaning of carbon contamination on multilayer optics of EUVL
Song, Y.; Q.-P. Lu; X.-P. Gong; Y. Wang and Z.-Q. Peng
2017
发表期刊Guangxue Jingmi Gongcheng/Optics and Precision Engineering
卷号25期号:11
摘要This paper focuses on the reflectivity decrease of reflective elements caused by the carbon contamination deposited on multilayers during EUV( Extreme Ultraviolet) lithography working and emphasizes the clear method of carbon contamination deposited on multilayers. The process of carbon contamination deposited on multilayers was elucidated and the damage of carbon contamination on the multilayers was introduced briefly. Several kinds of cleaning methods for carbon contamination deposited on multilayers were described in detail from cleaning mechanism, removing rate and cleaning effect, and their advantages and disadvantages were analyzed. The result indicates that the cleaning rates of plasma oxygen and activated oxygen reach 2 nm/min, but the multilayer surface is easy to be oxidized in cleaning process; and the plasma hydrogen and atomic hydrogen have relatively slow cleaning rates, they are only about 0.37 nm/min, but the multilayer surface is hardly to be oxidized. Moreover, the difficulties of different cleaning methods for X-ray multilayer mirrors in-situ are discussed. 2017, Science Press. All right reserved.
收录类别ei
语种中文
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/59195
专题中科院长春光机所知识产出
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Song, Y.,Q.-P. Lu,X.-P. Gong,et al. Cleaning of carbon contamination on multilayer optics of EUVL[J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering,2017,25(11).
APA Song, Y.,Q.-P. Lu,X.-P. Gong,&Y. Wang and Z.-Q. Peng.(2017).Cleaning of carbon contamination on multilayer optics of EUVL.Guangxue Jingmi Gongcheng/Optics and Precision Engineering,25(11).
MLA Song, Y.,et al."Cleaning of carbon contamination on multilayer optics of EUVL".Guangxue Jingmi Gongcheng/Optics and Precision Engineering 25.11(2017).
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