Changchun Institute of Optics,Fine Mechanics and Physics,CAS
KB mirror system of X-ray photo-emission electron microscope beamline | |
Chen, J.-H.; X.-P. Gong; S. Xue; Q.-P. Lu; Z.-Q. Peng; Y. Song and Y. Wang | |
2017 | |
发表期刊 | Guangxue Jingmi Gongcheng/Optics and Precision Engineering |
卷号 | 25期号:11 |
摘要 | A high accuracy micro-focusing system was designed to improve the light spot focusing quality of the X-ray beam-line for Photo-emission Electron Microscope (PEEM) in Shanghai Synchrotron Radiation Facility(SSRF). The layout of PEEM beam-line of the SSRF was introduced and basic parameters of optics of the micro-focusing system were presented. Two Kirkpatrick-Baez mirrors (KB mirror) were adopted to finish the design of micro-focusing system. The design scheme of a key component-posture adjusting mechanism in the system was introduced. Namely, a three vertical linear driving equipment and a two horizontal linear driving device were combined to implement five-dimensional adjustment of the system. The working principle and process of the posture adjusting mechanism were introduced, and the overall design scheme of micro-focusing system were analyzed deeply. The mechanical performance of KB mirror system was tested, and the testing results of the horizontal adjusting mechanism and the pitch motion of first mirror were given. That the resolution and repeat accuracy of horizontal adjusting mechanism are 0.6 m and 0.85 m respectively, and those of pitch motion are 0.4 and 0.5 respectively, which are better than that of the technical requirements. The other parameters were tested as well, and the results also satisfy the technical requirements. The realization of technical targets of KB mirror system guarantees the high quality focusing of PEEM bean-line. 2017, Science Press. All right reserved. |
收录类别 | ei |
语种 | 中文 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/58853 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Chen, J.-H.,X.-P. Gong,S. Xue,et al. KB mirror system of X-ray photo-emission electron microscope beamline[J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering,2017,25(11). |
APA | Chen, J.-H.,X.-P. Gong,S. Xue,Q.-P. Lu,Z.-Q. Peng,&Y. Song and Y. Wang.(2017).KB mirror system of X-ray photo-emission electron microscope beamline.Guangxue Jingmi Gongcheng/Optics and Precision Engineering,25(11). |
MLA | Chen, J.-H.,et al."KB mirror system of X-ray photo-emission electron microscope beamline".Guangxue Jingmi Gongcheng/Optics and Precision Engineering 25.11(2017). |
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