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Near-Infrared Absorption Enhancement Mechanism Investigations of Deep-Trench Silicon Microstructures Covered with Gold Films
Liu, X. Y.; J. S. Gao; H. G. Yang; H. Liu; X. Y. Wang and Z. F. Shen
2016
发表期刊Plasmonics
卷号11期号:4
摘要A broadband near-infrared (NIR) absorption from 1200 to 2500 nm in Si substrate is investigated by Ag film deposition and subsequent thermal annealing. Under thermal annealing, Ag films can crack and shrink into Ag nanoparticles (NPs). Annealing temperature greatly affects the size, distribution status and morphology of Ag NPs, resulting in different NIR absorption. The influence of the size and distribution of Ag NPs on NIR absorption originated from localized surface plasmon resonance (LSPR) is theoretically simulated by a finite difference time domain method. The band width of LSPR belongs to different type Ag NPs are discussed.
文章类型期刊
收录类别SCI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/57095
专题中科院长春光机所知识产出
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Liu, X. Y.,J. S. Gao,H. G. Yang,et al. Near-Infrared Absorption Enhancement Mechanism Investigations of Deep-Trench Silicon Microstructures Covered with Gold Films[J]. Plasmonics,2016,11(4).
APA Liu, X. Y.,J. S. Gao,H. G. Yang,H. Liu,&X. Y. Wang and Z. F. Shen.(2016).Near-Infrared Absorption Enhancement Mechanism Investigations of Deep-Trench Silicon Microstructures Covered with Gold Films.Plasmonics,11(4).
MLA Liu, X. Y.,et al."Near-Infrared Absorption Enhancement Mechanism Investigations of Deep-Trench Silicon Microstructures Covered with Gold Films".Plasmonics 11.4(2016).
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