Effective intensity distributions used for direct laser interference exposure

	Effective intensity distributions used for direct laser interference exposure
	Xu, J.; Z. B. Wang; Z. Zhang; D. P. Wang and Z. K. Weng
	2015
发表期刊	Rsc Advances
卷号	5 期号:68 页码:54947-54951
摘要	This paper presents a method to obtain periodic structures with different feature shapes using direct laser interference lithography. In the method, the desired structures are produced by controlling the effective intensity distributions of interference patterns during the exposure process. The effective intensity distributions are adjusted by changing the exposure beam intensity based on the material modification thresholds. In the simulations and experiments, different exposure intensities were used to study the interactions between the effective intensity distributions and the materials, and direct four- and six-beam laser interference lithography systems were set up to pattern silicon wafers. The shapes and sizes of the fabricated surface structures changed with the effective intensities. The experimental results are in accordance with the theoretical models and simulations.
收录类别	SCI ; EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/55488
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Xu, J.,Z. B. Wang,Z. Zhang,et al. Effective intensity distributions used for direct laser interference exposure[J]. Rsc Advances,2015,5(68):54947-54951.
APA	Xu, J.,Z. B. Wang,Z. Zhang,&D. P. Wang and Z. K. Weng.(2015).Effective intensity distributions used for direct laser interference exposure.Rsc Advances,5(68),54947-54951.
MLA	Xu, J.,et al."Effective intensity distributions used for direct laser interference exposure".Rsc Advances 5.68(2015):54947-54951.

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Xu-2015-Effective in（901KB）	期刊论文	作者接受稿	开放获取	CC BY-NC-SA	浏览下载