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Electrical properties of zinc-oxide-based thin-film transistors using strontium-oxide-doped semiconductors
Wu, S. H.; N. Zhang; Y. S. Hu; H. Chen; D. P. Jiang and X. Y. Liu
2015
发表期刊Chinese Physics B
卷号24期号:10页码:5
摘要Strontium-zinc-oxide (SrZnO) films forming the semiconductor layers of thin-film transistors (TFTs) are deposited by using ion-assisted electron beam evaporation. Using strontium-oxide-doped semiconductors, the off-state current can be dramatically reduced by three orders of magnitude. This dramatic improvement is attributed to the incorporation of strontium, which suppresses carrier generation, thereby improving the TFT. Additionally, the presence of strontium inhibits the formation of zinc oxide (ZnO) with the hexagonal wurtzite phase and permits the formation of an unusual phase of ZnO, thus significantly changing the surface morphology of ZnO and effectively reducing the trap density of the channel.
收录类别SCI ; EI
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/55477
专题中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Wu, S. H.,N. Zhang,Y. S. Hu,et al. Electrical properties of zinc-oxide-based thin-film transistors using strontium-oxide-doped semiconductors[J]. Chinese Physics B,2015,24(10):5.
APA Wu, S. H.,N. Zhang,Y. S. Hu,H. Chen,&D. P. Jiang and X. Y. Liu.(2015).Electrical properties of zinc-oxide-based thin-film transistors using strontium-oxide-doped semiconductors.Chinese Physics B,24(10),5.
MLA Wu, S. H.,et al."Electrical properties of zinc-oxide-based thin-film transistors using strontium-oxide-doped semiconductors".Chinese Physics B 24.10(2015):5.
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