Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems

	Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems
	Xu, X. R.; W. Huang and M. F. Xu
	2015
发表期刊	Optics Express
卷号	23 期号:21 页码:27911-27919
摘要	Optical lithography has approached a regime of high numerical aperture and wide field, where the impact of polarization aberration on imaging quality turns to be serious. Most of the existing studies focused on the distribution rule of polarization aberration on the pupil, and little attention had been paid to the field. In this paper, a new orthonormal set of polynomials is established to describe the polarization aberration of rotationally symmetric optical systems. The polynomials can simultaneously reveal the distribution rules of polarization aberration on the exit pupil and the field. Two examples are given to verify the polynomials. (C) 2015 Optical Society of America
收录类别	SCI ; EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/55369
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Xu, X. R.,W. Huang and M. F. Xu. Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems[J]. Optics Express,2015,23(21):27911-27919.
APA	Xu, X. R.,&W. Huang and M. F. Xu.(2015).Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems.Optics Express,23(21),27911-27919.
MLA	Xu, X. R.,et al."Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems".Optics Express 23.21(2015):27911-27919.

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