Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm

	Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm
	Yu, B.; C. S. Jin; S. Yao; C. Li; H. Wang; F. Zhou; B. Y. Guo; Y. Xie; Y. Liu and L. P. Wang
	2015
发表期刊	Optics Letters
卷号	40 期号:17 页码:3958-3961
摘要	An inversion method based on a genetic algorithm has been developed to control the lateral thickness gradients of a Mo-Si multilayer deposited on curved substrates by planar magnetron sputtering. At first, the sputtering distribution of the target is inversed from coating thickness profiles of flat substrates at different heights. Then, the speed profiles of substrates sweeping across the target are optimized according to the desired coating thickness profiles of the primary and secondary mirrors in a two-bounce projection system. The measured coating thickness profiles show that the non-compensable added figure error is below 0.1 nm rms, and the wavelength uniformity across each mirror surface is within +/- 0.2% P-V. The inversion method introduced here exhibits its convenience in obtaining the sputtering distribution of the target and efficiency in coating iterations during process development. (C) 2015 Optical Society of America
收录类别	SCI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/55205
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Yu, B.,C. S. Jin,S. Yao,et al. Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm[J]. Optics Letters,2015,40(17):3958-3961.
APA	Yu, B..,C. S. Jin.,S. Yao.,C. Li.,H. Wang.,...&Y. Liu and L. P. Wang.(2015).Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm.Optics Letters,40(17),3958-3961.
MLA	Yu, B.,et al."Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm".Optics Letters 40.17(2015):3958-3961.

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