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ADRC based on disturbance frequency adaptive of aerial photoelectrical stabilized platform
Li X.; Zhang B.; Sun J.; Mao D.; Bai X.; Shen H.
2014
发表期刊Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering
ISSNISBN/10072276
卷号43期号:5页码:1574-1581
摘要In order to improve isolation degree of disturbance, a new active disturbance-rejection controller based on disturbance frequency adaptive was proposed. Firstly, the ESO based on disturbance frequency adaptive was designed in order to avoid phase lag when ESO observed the disturbance in the second-order and more second-order system. And then, the controller was designed. Finally, an experiment was performed to test the disturbance rejection performance of the ADRC based on disturbance frequency adaptive when the speed disturbance was from 0.1 Hz to 2.5 Hz as compared with the traditional square lag-lead compensation method. The results show that ADRC can reduce the disturbance error 6.72 dB at least. And the isolation degree of disturbance was improved obviously when the perturbation frequency was more than 0.5 Hz, the best isolation degree of disturbance was increased 12.94 dB. And the ADRC had strong robustness, allowing system parameters to range from -10% to 10%. In conclusion, the ADRC based on disturbance frequency adaptive satisfies the performance requirements of aerial photoelectrical stabilized platform and has higher practical value.
收录类别EI
语种中文
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/43712
专题中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Li X.,Zhang B.,Sun J.,et al. ADRC based on disturbance frequency adaptive of aerial photoelectrical stabilized platform[J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,2014,43(5):1574-1581.
APA Li X.,Zhang B.,Sun J.,Mao D.,Bai X.,&Shen H..(2014).ADRC based on disturbance frequency adaptive of aerial photoelectrical stabilized platform.Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,43(5),1574-1581.
MLA Li X.,et al."ADRC based on disturbance frequency adaptive of aerial photoelectrical stabilized platform".Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering 43.5(2014):1574-1581.
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