Multilayer Mirrors Used for the Moon-Based EUV Imager

	Multilayer Mirrors Used for the Moon-Based EUV Imager
	Liu Z.; Gao J. S.; Chen B.; Wang T. T.; Wang X. Y.; Shen Z. F.; Chen H.
	2013
发表期刊	Spectroscopy and Spectral Analysis
ISSN	ISBN/1000-0593
卷号	33 期号:1
摘要	The EUV imager is used to observe the 30.4 nm radiation of the earth's plasmasphere on the lunar surface. The 30.4 nm multilayer is the key optical part of the imager. According to the technical parameters, the B4C/Mg, B4C/Mg2Si, B4C/Al, B4C/Si, Mo/Si and so on were chosen. The period thickness, ratio of the material and the number of the periods were optimized and the reflectivity of those multilayers were calculated. In consideration of the lunar environment, the Mo/Si and the B4C/Si multilayer were deposited by magnetron sputtering coating plant. The reflectivity of Mo/Si and B4C/Si multilayer at 30.4 nm is 15.3% and 22.8% respectively.
收录类别	SCI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/40765
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Liu Z.,Gao J. S.,Chen B.,et al. Multilayer Mirrors Used for the Moon-Based EUV Imager[J]. Spectroscopy and Spectral Analysis,2013,33(1).
APA	Liu Z..,Gao J. S..,Chen B..,Wang T. T..,Wang X. Y..,...&Chen H..(2013).Multilayer Mirrors Used for the Moon-Based EUV Imager.Spectroscopy and Spectral Analysis,33(1).
MLA	Liu Z.,et al."Multilayer Mirrors Used for the Moon-Based EUV Imager".Spectroscopy and Spectral Analysis 33.1(2013).