Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Multilayer Mirrors Used for the Moon-Based EUV Imager | |
Liu Z.; Gao J. S.; Chen B.; Wang T. T.; Wang X. Y.; Shen Z. F.; Chen H. | |
2013 | |
发表期刊 | Spectroscopy and Spectral Analysis |
ISSN | ISBN/1000-0593 |
卷号 | 33期号:1 |
摘要 | The EUV imager is used to observe the 30.4 nm radiation of the earth's plasmasphere on the lunar surface. The 30.4 nm multilayer is the key optical part of the imager. According to the technical parameters, the B4C/Mg, B4C/Mg2Si, B4C/Al, B4C/Si, Mo/Si and so on were chosen. The period thickness, ratio of the material and the number of the periods were optimized and the reflectivity of those multilayers were calculated. In consideration of the lunar environment, the Mo/Si and the B4C/Si multilayer were deposited by magnetron sputtering coating plant. The reflectivity of Mo/Si and B4C/Si multilayer at 30.4 nm is 15.3% and 22.8% respectively. |
收录类别 | SCI |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/40765 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Liu Z.,Gao J. S.,Chen B.,et al. Multilayer Mirrors Used for the Moon-Based EUV Imager[J]. Spectroscopy and Spectral Analysis,2013,33(1). |
APA | Liu Z..,Gao J. S..,Chen B..,Wang T. T..,Wang X. Y..,...&Chen H..(2013).Multilayer Mirrors Used for the Moon-Based EUV Imager.Spectroscopy and Spectral Analysis,33(1). |
MLA | Liu Z.,et al."Multilayer Mirrors Used for the Moon-Based EUV Imager".Spectroscopy and Spectral Analysis 33.1(2013). |
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