Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures

	Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures
	Liu Y. C.; Giorgis F.; Pirri C. F.
	1997
发表期刊	Philosophical Magazine B-Physics of Condensed Matter Statistical Mechanics Electronic Optical and Magnetic Properties
ISSN	0141-8637
卷号	75 期号:4 页码:485-496
摘要	The thermal stability of hydrogenated amorphous silicon-carbon (aSi(1-x)C(x):H) alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures was characterized by means of infrared spectroscopy, electron spin resonance, transmittance-reflectance spectroscopy and photoluminescence (PL) spectroscopy. It is demonstrated that the network undergoes relaxation and reconstruction under the condition of low-temperature annealing. Weak C-C, Si-Si and C-Si bonds will be broken, and a new stage of hydrogen effusion and structural rearrangement will occur under the condition of high-temperature annealing. The thermal stability a-Si1-xCx:H of films increases with increase in carbon content. In carbon-poor a-Si1-xCx:H networks, the dangling bonds are the main non-radiative recombination channel, which causes a strong correlation of the PL signal with defect density. In carbon-rich a-Si1-xCx:H networks, pi-bonded clusters play an important role in the luminescence process. The PL intensity has little dependence on defects in carbon-rich a-Si1-xCx:H.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/34469
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Liu Y. C.,Giorgis F.,Pirri C. F.. Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures[J]. Philosophical Magazine B-Physics of Condensed Matter Statistical Mechanics Electronic Optical and Magnetic Properties,1997,75(4):485-496.
APA	Liu Y. C.,Giorgis F.,&Pirri C. F..(1997).Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures.Philosophical Magazine B-Physics of Condensed Matter Statistical Mechanics Electronic Optical and Magnetic Properties,75(4),485-496.
MLA	Liu Y. C.,et al."Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures".Philosophical Magazine B-Physics of Condensed Matter Statistical Mechanics Electronic Optical and Magnetic Properties 75.4(1997):485-496.

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