Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique

	Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique
	Meng L. J.; Liang E. J.; Gao J. S.; Teixeira V.; dos Santos M. P.
	2009
发表期刊	Journal of Nanoscience and Nanotechnology
ISSN	1533-4880
卷号	9 期号:7 页码:4151-4155
摘要	Indium tin oxide (ITO) thin films have been deposited onto acrylics (PMMA) substrates by ion beam assisted deposition technique at different oxygen flows. The structural, optical and electrical properties of the deposited films have been characterized by X-ray diffraction, transmittance, FTIR, ellipsometry and Hall effect measurements. The optical constants of the deposited films have been calculated by fitting the ellipsometric spectra. The effects of the oxygen flow on the properties of the deposited films have been studied. It has been found that 40 sccm oxygen flow is an optimum value for getting the films with good transmittance and low electrical resistivity.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/34349
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Meng L. J.,Liang E. J.,Gao J. S.,et al. Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique[J]. Journal of Nanoscience and Nanotechnology,2009,9(7):4151-4155.
APA	Meng L. J.,Liang E. J.,Gao J. S.,Teixeira V.,&dos Santos M. P..(2009).Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique.Journal of Nanoscience and Nanotechnology,9(7),4151-4155.
MLA	Meng L. J.,et al."Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique".Journal of Nanoscience and Nanotechnology 9.7(2009):4151-4155.

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