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Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique
Meng L. J.; Liang E. J.; Gao J. S.; Teixeira V.; dos Santos M. P.
2009
发表期刊Journal of Nanoscience and Nanotechnology
ISSN1533-4880
卷号9期号:7页码:4151-4155
摘要Indium tin oxide (ITO) thin films have been deposited onto acrylics (PMMA) substrates by ion beam assisted deposition technique at different oxygen flows. The structural, optical and electrical properties of the deposited films have been characterized by X-ray diffraction, transmittance, FTIR, ellipsometry and Hall effect measurements. The optical constants of the deposited films have been calculated by fitting the ellipsometric spectra. The effects of the oxygen flow on the properties of the deposited films have been studied. It has been found that 40 sccm oxygen flow is an optimum value for getting the films with good transmittance and low electrical resistivity.
收录类别SCI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/34349
专题中科院长春光机所知识产出
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Meng L. J.,Liang E. J.,Gao J. S.,et al. Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique[J]. Journal of Nanoscience and Nanotechnology,2009,9(7):4151-4155.
APA Meng L. J.,Liang E. J.,Gao J. S.,Teixeira V.,&dos Santos M. P..(2009).Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique.Journal of Nanoscience and Nanotechnology,9(7),4151-4155.
MLA Meng L. J.,et al."Study of Indium Tin Oxide Thin Films Deposited on Acrylics Substrates by Ion Beam Assisted Deposition Technique".Journal of Nanoscience and Nanotechnology 9.7(2009):4151-4155.
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