Blazed silicon gratings fabricated by deflecting crystal orientation (111)silicon wafer

	Blazed silicon gratings fabricated by deflecting crystal orientation (111)silicon wafer
其他题名	论文其他题名
	Ju H.; Zhang P.; Liang J. Q.; Wang S. R.; Wu Y. H.
	2005
发表期刊	Journal of Microlithography Microfabrication and Microsystems
ISSN	1537-1646
卷号	4 期号:1
摘要	Bulk silicon wet etching can be used to fabricate silicon gratings. Wet etching depends on the anisotropic property of monocrystalline silicon. Blazed gratings for different spectral ranges can be fabricated by this method, and facets of grooves are formed by crystallographic planes of the monocrystalline silicon wafer. We develop a method to fabricate blazed gratings using deflecting crystal orientation (111) silicon wafers. The topographies of the samples are measured by SEM and atomic force microscopy (AFM), and the results indicate that the samples have grooves of good uniformity and facets of excellent optical quality. (c) 2005 Society of Photo-Optical Instrumentation Engineers.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26811
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Ju H.,Zhang P.,Liang J. Q.,et al. Blazed silicon gratings fabricated by deflecting crystal orientation (111)silicon wafer[J]. Journal of Microlithography Microfabrication and Microsystems,2005,4(1).
APA	Ju H.,Zhang P.,Liang J. Q.,Wang S. R.,&Wu Y. H..(2005).Blazed silicon gratings fabricated by deflecting crystal orientation (111)silicon wafer.Journal of Microlithography Microfabrication and Microsystems,4(1).
MLA	Ju H.,et al."Blazed silicon gratings fabricated by deflecting crystal orientation (111)silicon wafer".Journal of Microlithography Microfabrication and Microsystems 4.1(2005).

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