Visible photo luminescence of Si clusters embedded in silicon nitride films by plasma-enhanced chemical vapor deposition

	Visible photo luminescence of Si clusters embedded in silicon nitride films by plasma-enhanced chemical vapor deposition
其他题名	论文其他题名
	Wang Y.; Shen D. Z.; Liu Y. C.; Zhang J. Y.; Zhang Z. Z.; Liu Y. L.; Lu Y. M.; Fan X. M.
	2005
发表期刊	Physica E-Low-Dimensional Systems & Nanostructures
ISSN	1386-9477
卷号	27 期号:1—2 页码:284-289
摘要	Strong visible photoluminescence (PL) has been observed in the hydrogenated amorphous silicon nitride (a-SiNx:H) films prepared by plasma-enhanced chemical vapor deposition (PECVD). With various temperatures annealing, the evolution of the structure and of the PL properties has been studied to explain the PL origin. With the disappearance of PL peak with respect to equivalent to Si-0 (dangling bonds) at the higher annealing temperature, the intense PL peak shows an obvious blueshift. Accompanying with the blueshift, a new PL peak on the high-energy side, about 640 nm, has been observed in the spectra, and the appearance of the new PL peak has been discussed. In terms of the present results, the intense PL originates from the Si clusters embedded in the silicon nitride. (c) 2005 Elsevier B.V. All rights reserved.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26778
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang Y.,Shen D. Z.,Liu Y. C.,et al. Visible photo luminescence of Si clusters embedded in silicon nitride films by plasma-enhanced chemical vapor deposition[J]. Physica E-Low-Dimensional Systems & Nanostructures,2005,27(1—2):284-289.
APA	Wang Y..,Shen D. Z..,Liu Y. C..,Zhang J. Y..,Zhang Z. Z..,...&Fan X. M..(2005).Visible photo luminescence of Si clusters embedded in silicon nitride films by plasma-enhanced chemical vapor deposition.Physica E-Low-Dimensional Systems & Nanostructures,27(1—2),284-289.
MLA	Wang Y.,et al."Visible photo luminescence of Si clusters embedded in silicon nitride films by plasma-enhanced chemical vapor deposition".Physica E-Low-Dimensional Systems & Nanostructures 27.1—2(2005):284-289.

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