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Effect of the oxygen flow on the properties of ITO thin films deposited by ion beam assisted deposition (IBAD)
其他题名论文其他题名
Meng L. J.; Gao J. S.; Silva R. A.; Song S. G.
2008
发表期刊Thin Solid Films
ISSN0040-6090
卷号516期号:16页码:5454-5459
摘要ITO films were deposited onto glass substrates by ion beam assisted deposition method. The oxygen ions were produced using a Kaufman ion source. The oxygen flow was varied from 20 until 60 sccm and the effect of the oxygen flow on properties of ITO films has been studied. The structural properties of the film were characterized by X-ray diffraction and atomic force microscopy. The optical properties were characterized by optical transmission measurements and the optical constants (refractive index n and extinction coefficient k) and film thickness have been obtained by fitting the transmittance using a semi-quantum model. The electrical properties were characterized by Hall effect measurements. It has been found that the ITO film with low electrical resistivity and high transmittance can be obtained with 40 sccm oxygen flow (the working pressure is about 2.3 x 10(-2) Pa at this oxygen flow). (c) 2007 Elsevier B.V. All rights reserved.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26443
专题中科院长春光机所知识产出
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Meng L. J.,Gao J. S.,Silva R. A.,et al. Effect of the oxygen flow on the properties of ITO thin films deposited by ion beam assisted deposition (IBAD)[J]. Thin Solid Films,2008,516(16):5454-5459.
APA Meng L. J.,Gao J. S.,Silva R. A.,&Song S. G..(2008).Effect of the oxygen flow on the properties of ITO thin films deposited by ion beam assisted deposition (IBAD).Thin Solid Films,516(16),5454-5459.
MLA Meng L. J.,et al."Effect of the oxygen flow on the properties of ITO thin films deposited by ion beam assisted deposition (IBAD)".Thin Solid Films 516.16(2008):5454-5459.
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