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Memory effect and negative differential resistance in tris-(8-hydroxy quinoline) aluminum/bathocuproine bilayer devices
其他题名论文其他题名
Su Z. S.; Fung M. K.; Lee C. S.; Li W. L.; Lee S. T.
2008
发表期刊Applied Physics Letters
ISSN0003-6951
卷号93期号:8
摘要Memory effect and negative differential resistance (NDR) were observed in simple tris-(8-hydroxyquinoline) aluminum/bathocuproine (BCP) bilayer devices. The devices could be switched from a low conductance state to a high conductance state when a negative bias was applied and could be restored to an OFF state when a positive bias was applied beyond the NDR region. The memory effect is nonvolatile, and an ON/OFF ratio of over 10(3) was achieved. The memory effect was observed only in the presence of both Alq(3) and BCP layers, and the NDR is attributed to the defects formed in the BCP layer upon evaporation of an Al cathode. (c) 2008 American Institute of Physics.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26440
专题中科院长春光机所知识产出
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Su Z. S.,Fung M. K.,Lee C. S.,et al. Memory effect and negative differential resistance in tris-(8-hydroxy quinoline) aluminum/bathocuproine bilayer devices[J]. Applied Physics Letters,2008,93(8).
APA Su Z. S.,Fung M. K.,Lee C. S.,Li W. L.,&Lee S. T..(2008).Memory effect and negative differential resistance in tris-(8-hydroxy quinoline) aluminum/bathocuproine bilayer devices.Applied Physics Letters,93(8).
MLA Su Z. S.,et al."Memory effect and negative differential resistance in tris-(8-hydroxy quinoline) aluminum/bathocuproine bilayer devices".Applied Physics Letters 93.8(2008).
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