We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An Mo/Si multilayer-coated specimen with a blaze angle of 1.9 degrees was fabricated and measured. At an incident angle of 10 degrees and a wavelength of 13.62 nm, the diffraction efficiency of the negative second order reaches 36.2%. (C) 2008 Optical Society of America.
Lin H.,Zhang L. C.,Li L. F.,et al. High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region[J]. Optics Letters,2008,33(5):485-487.
APA
Lin H.,Zhang L. C.,Li L. F.,Jin C. S.,Zhou H. J.,&Huo T. L..(2008).High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region.Optics Letters,33(5),485-487.
MLA
Lin H.,et al."High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region".Optics Letters 33.5(2008):485-487.
修改评论