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Influence of diamond film thickness on field emission characteristics
其他题名论文其他题名
Ji H.; Jin Z. S.; Gu C. Z.; Wang J. Y.; Lu X. Y.; Liu B. B.; Gao C. X.; Yuan G.; Wang W. B.
2000
发表期刊Journal of Vacuum Science & Technology B
ISSN1071-1023
卷号18期号:6页码:2710-2713
摘要Diamond films with various thicknesses (0.15-9 mum) were grown by microwave plasma chemical vapor deposition. The lowest threshold field strength for electron emission was 3 V/mum for the similar to1.5-mum-thick diamond film. The results were analyzed by effective emission areas and effective work function according to Fowler-Nordheim theory. It was found that the threshold voltage was strongly affected by the ratio of (111) and (110) oriented grains in the films. The larger the fraction of (111) oriented grains, the lower the effective work function in agreement with the reported negative electron affinity of (111) surfaces. (C) 2000 American Vacuum Society. [S0734-211X(00)18106-5].
收录类别SCI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/25914
专题中科院长春光机所知识产出
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GB/T 7714
Ji H.,Jin Z. S.,Gu C. Z.,et al. Influence of diamond film thickness on field emission characteristics[J]. Journal of Vacuum Science & Technology B,2000,18(6):2710-2713.
APA Ji H..,Jin Z. S..,Gu C. Z..,Wang J. Y..,Lu X. Y..,...&Wang W. B..(2000).Influence of diamond film thickness on field emission characteristics.Journal of Vacuum Science & Technology B,18(6),2710-2713.
MLA Ji H.,et al."Influence of diamond film thickness on field emission characteristics".Journal of Vacuum Science & Technology B 18.6(2000):2710-2713.
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