Influence of diamond film thickness on field emission characteristics

	Influence of diamond film thickness on field emission characteristics
其他题名	论文其他题名
	Ji H.; Jin Z. S.; Gu C. Z.; Wang J. Y.; Lu X. Y.; Liu B. B.; Gao C. X.; Yuan G.; Wang W. B.
	2000
发表期刊	Journal of Vacuum Science & Technology B
ISSN	1071-1023
卷号	18 期号:6 页码:2710-2713
摘要	Diamond films with various thicknesses (0.15-9 mum) were grown by microwave plasma chemical vapor deposition. The lowest threshold field strength for electron emission was 3 V/mum for the similar to1.5-mum-thick diamond film. The results were analyzed by effective emission areas and effective work function according to Fowler-Nordheim theory. It was found that the threshold voltage was strongly affected by the ratio of (111) and (110) oriented grains in the films. The larger the fraction of (111) oriented grains, the lower the effective work function in agreement with the reported negative electron affinity of (111) surfaces. (C) 2000 American Vacuum Society. [S0734-211X(00)18106-5].
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25914
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Ji H.,Jin Z. S.,Gu C. Z.,et al. Influence of diamond film thickness on field emission characteristics[J]. Journal of Vacuum Science & Technology B,2000,18(6):2710-2713.
APA	Ji H..,Jin Z. S..,Gu C. Z..,Wang J. Y..,Lu X. Y..,...&Wang W. B..(2000).Influence of diamond film thickness on field emission characteristics.Journal of Vacuum Science & Technology B,18(6),2710-2713.
MLA	Ji H.,et al."Influence of diamond film thickness on field emission characteristics".Journal of Vacuum Science & Technology B 18.6(2000):2710-2713.

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