Electron emission from nanocrystalline diamond films

	Electron emission from nanocrystalline diamond films
其他题名	论文其他题名
	Gu C. Z.; Jiang X.; Jin Z. S.; Wang W. B.
	2001
发表期刊	Journal of Vacuum Science & Technology B (IF:1.351[JCR-2018],1.257[5-Year])
ISSN	1071-1023
卷号	19 期号:3 页码:962-964
摘要	The; electron emission properties: of nanocrystalline diamond films were described. The nanometer structured diamond films were deposited by the microwave plasma assistance chemical vapor deposition method via continuous H+ ion bombardment. The grain size of nanocrystalline diamond films can be modified by means of changing the energy of bombarded ions. Scanning electron microscopy and Raman spectroscopy indicated the nanometer structure of the films. The results suggested that low-field electron emission and high emission current can be obtained from the films consisting of nanosized diamond grains. (C) 2001 American Vacuum Society.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25890
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Gu C. Z.,Jiang X.,Jin Z. S.,et al. Electron emission from nanocrystalline diamond films[J]. Journal of Vacuum Science & Technology B,2001,19(3):962-964.
APA	Gu C. Z.,Jiang X.,Jin Z. S.,&Wang W. B..(2001).Electron emission from nanocrystalline diamond films.Journal of Vacuum Science & Technology B,19(3),962-964.
MLA	Gu C. Z.,et al."Electron emission from nanocrystalline diamond films".Journal of Vacuum Science & Technology B 19.3(2001):962-964.

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