Growth of high quality ZnO thin films at low temperature on Si(100) substrates by plasma enhanced chemical vapor deposition

	Growth of high quality ZnO thin films at low temperature on Si(100) substrates by plasma enhanced chemical vapor deposition
其他题名	论文其他题名
	Li B. S.; Liu Y. C.; Shen D. Z.; Lu Y. M.; Zhang J. Y.; Kong X. G.; Fan X. W.; Zhi Z. Z.
	2002
发表期刊	Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
ISSN	0734-2101
卷号	20 期号:1 页码:265-269
摘要	High quality ZnO thin films with a c-axis-orientated wurtize structure have been grown on a Si(100) substrate by plasma enhanced chemical vapor deposition using a zinc organic source [Zn(C2H5)(2)] and carbon dioxide (CO2) gas mixture at low temperature, The dependence of ZnO thin-film quality on the gas flow rate ratio of Zn(C2H5)(2) to CO2 (GFRRZC) is studied-by x-ray diffraction (XRD), optical transmission spectra (OTS), and photoluminescence spectra (PL). The optical properties show that the GFRRZC has an obvious effect on the band gap of ZnO films. The relationship between the quality of the ZnO thin films and the substrate temperatures is also studied by XRD and PL spectra. The XRD spectra show that the full width at half maximum (FWHM) of the diffraction peak at 34.42degrees of (0002) oriented ZnO is 0.25degrees at the optimized condition, indicating the formation of high quality ZnO films. The PL spectra show a strong excitonic emission at about 3.26 eV without the emission around 2.5 eV related to deep-level defects, implying the formation of the stoichiometric ZnO thin films. The smallest FWHM of the PL spectrum of a ZnO thin film is 111 meV at room temperature. (C) 2002 American Vacuum Society.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25871
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li B. S.,Liu Y. C.,Shen D. Z.,et al. Growth of high quality ZnO thin films at low temperature on Si(100) substrates by plasma enhanced chemical vapor deposition[J]. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,2002,20(1):265-269.
APA	Li B. S..,Liu Y. C..,Shen D. Z..,Lu Y. M..,Zhang J. Y..,...&Zhi Z. Z..(2002).Growth of high quality ZnO thin films at low temperature on Si(100) substrates by plasma enhanced chemical vapor deposition.Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,20(1),265-269.
MLA	Li B. S.,et al."Growth of high quality ZnO thin films at low temperature on Si(100) substrates by plasma enhanced chemical vapor deposition".Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 20.1(2002):265-269.

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