Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition

	Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition
其他题名	论文其他题名
	Li B. S.; Liu Y. C.; Zhi Z. Z.; Shen D. Z.; Zhang J. Y.; Lu Y. M.; Fan X. W.; Kong X. G.
	2002
发表期刊	Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
ISSN	0734-2101
卷号	20 期号:5 页码:1779-1783
摘要	ZnO thin films have been grown on Si(100) substrate by plasma enhanced chemical vapor deposition using a zinc organic source [Zn(C2H5)(2)] and carbon dioxide (CO2) gas mixture at 503 K. The dependence of ZnO thin film quality on the gas flow rate ratio of Zn(C2H5)(2) to CO2 (GFRRZC) is studied by x-ray diffraction (XRD), optical absorption (OA) spectra, and photoluminescence (PL) spectra. An excitonic absorption peak is observed in the OA spectra, which closely depends on the GFRRZCs. The NRD spectra show that a c-axis-orientated wurtzite structure ZnO thin film with the full width at half maximum (FWHM) of 0.24degrees has been prepared. The PL spectra show a strong UV emission with a narrow FWHM of 105 meV at 3.289 eV with a weak deep-level defect emission around 2.5 eV, implying the formation of the stoichiometric ZnO thin films. The origin of the UV band is from the free exciton recombination testified by the temperature dependent PL spectra. (C) 2002 American Vacuum Society.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25864
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li B. S.,Liu Y. C.,Zhi Z. Z.,et al. Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition[J]. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,2002,20(5):1779-1783.
APA	Li B. S..,Liu Y. C..,Zhi Z. Z..,Shen D. Z..,Zhang J. Y..,...&Kong X. G..(2002).Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition.Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,20(5),1779-1783.
MLA	Li B. S.,et al."Growth of stoichiometric (002) ZnO thin films on Si (001) substrate by using plasma enhanced chemical vapor deposition".Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 20.5(2002):1779-1783.

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