The reflectivity measurement of the 28.5nm multilayer mirror

	The reflectivity measurement of the 28.5nm multilayer mirror
其他题名	论文其他题名
	Huang W. Z.; Li Y. J.; Gu Y. Q.; Zhang J.; You Y. L.; Cun Y. S.; He Y. L.; Lei A. L.; Chen C. L.; Ma Y. Y.; Jin C. S.
	2003
发表期刊	Acta Physica Sinica
ISSN	1000-3290
卷号	52 期号:4 页码:809-812
摘要	The reflectivity of the 28.5nm Mo/Si multilayer mirrors are measured at Xingguang-II laser facility using a flat-field grating spectrograph with the Ne-like Cr x-ray laser as a soft x-ray source. The reflectivities obtained for two samples are 0.031 and 0.096.
收录类别	SCI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25820
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Huang W. Z.,Li Y. J.,Gu Y. Q.,et al. The reflectivity measurement of the 28.5nm multilayer mirror[J]. Acta Physica Sinica,2003,52(4):809-812.
APA	Huang W. Z..,Li Y. J..,Gu Y. Q..,Zhang J..,You Y. L..,...&Jin C. S..(2003).The reflectivity measurement of the 28.5nm multilayer mirror.Acta Physica Sinica,52(4),809-812.
MLA	Huang W. Z.,et al."The reflectivity measurement of the 28.5nm multilayer mirror".Acta Physica Sinica 52.4(2003):809-812.