Fabrication of antireflective subwavelength grating at infrared 30 mu m region

	Fabrication of antireflective subwavelength grating at infrared 30 mu m region
其他题名	论文其他题名
	Cao Z. L.; Lu Z. W.; Zhang P.; Wang S. R.; Zhao J. L.; Li F. Y.
	2004
发表期刊	Journal of Infrared and Millimeter Waves
ISSN	1001-9014
卷号	23 期号:1 页码:6-10
摘要	Antireflective subwavelength grating was designed by using rigorous coupled wave approach ( RCWA). The square-pillar grating was fabricated by plasma assisted etching. Testing results show that the grating has a very good antireflective characteristic, and the values of testing parameters approximately equal to the designed data. It indicates that the plasma assisted etching method is valid to fabricate deep groove grating. The experimental results are analyzed and discussed. It is shown that the critical periodic point as a function of refractive index is very important to fabricate the antireflective subwavelength grating.
收录类别	SCI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25801
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Cao Z. L.,Lu Z. W.,Zhang P.,et al. Fabrication of antireflective subwavelength grating at infrared 30 mu m region[J]. Journal of Infrared and Millimeter Waves,2004,23(1):6-10.
APA	Cao Z. L.,Lu Z. W.,Zhang P.,Wang S. R.,Zhao J. L.,&Li F. Y..(2004).Fabrication of antireflective subwavelength grating at infrared 30 mu m region.Journal of Infrared and Millimeter Waves,23(1),6-10.
MLA	Cao Z. L.,et al."Fabrication of antireflective subwavelength grating at infrared 30 mu m region".Journal of Infrared and Millimeter Waves 23.1(2004):6-10.

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