Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Studies on 0.96 and 0.84 eV photoluminescence emissions in GaAs epilayers grown on Si | |
其他题名 | 论文其他题名 |
Liang J. C.; Jiang J. H.; Zhao J. L.; Gao Y. | |
1996 | |
发表期刊 | Journal of Applied Physics |
ISSN | 0021-8979 |
卷号 | 79期号:9页码:7173-7176 |
摘要 | Studies on the 0.96 and 0.84 eV photoluminescence (PL) emissions at various temperatures in GaAs epilayers grown on Si with [As]/[Ga]=20-50 by metalorganic chemical vapor deposition were made. In terms of an Arrhenius plot and configurational coordinate model, the thermal activation energy and Franck-Condon (FC) shift for the 0.96 eV emission band were obtained by measuring the variations in its PL intensity and full width at half-maximum with temperature, respectively. The dependence on PL intensity versus temperature of the 0.84 eV PL emission could not be fitted with an Arrhenius plot. Instead, it could be fitted with the formula used for amorphous semiconductors or localized states which allowed us to relate this emission with the presence of defects in the heteroepitaxial GaAs layers grown on Si investigated. Taking into account the FC and band-gap shifts, the energy relationships of the transitions from donor to acceptor, from conduction band to acceptor, and from donor to valence band were reformulated. In terms of these transition-energy relationships and experimental data, the 0.96 eV emission was explained as the recombination luminescence of the donor-acceptor pair, composed of an arsenic vacancy and a gallium vacancy, and the 0.84 eV emission as the transition from the localized As interstitial-Ga vacancy complex center to Ga vacancy. (C) 1996 American Institute of Physics. |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:A1996UJ08400075 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25423 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Liang J. C.,Jiang J. H.,Zhao J. L.,et al. Studies on 0.96 and 0.84 eV photoluminescence emissions in GaAs epilayers grown on Si[J]. Journal of Applied Physics,1996,79(9):7173-7176. |
APA | Liang J. C.,Jiang J. H.,Zhao J. L.,&Gao Y..(1996).Studies on 0.96 and 0.84 eV photoluminescence emissions in GaAs epilayers grown on Si.Journal of Applied Physics,79(9),7173-7176. |
MLA | Liang J. C.,et al."Studies on 0.96 and 0.84 eV photoluminescence emissions in GaAs epilayers grown on Si".Journal of Applied Physics 79.9(1996):7173-7176. |
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