Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Effects of interfacial interaction potential on the sublimation rates of TNT films on a silica surface examined by QCM and AFM techniques | |
其他题名 | 论文其他题名 |
Mu R.; Ueda A.; Liu Y. C.; Wu M.; Henderson D. O.; Lareau R. T.; Chamberlain R. T. | |
2003 | |
发表期刊 | Surface Science
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ISSN | 0039-6028 |
卷号 | 530期号:1—2页码:L293-L296 |
摘要 | The study of 2,4,6-trinitrotoluene (TNT) sublimation rates from the bulk surface and a substrate surface have been evaluated quantitatively with both atomic force microscopy and quartz crystal microbalance (QCM) techniques. A first principle theoretical model is proposed, which allows obtaining three critical parameters, bulk sublimation rate, surface interaction potential, and the effective decay length, with no arbitrary parameters. The bulk sublimation rate predicted by the model is quantitatively confirmed by QCM experiments. The isothermal measurements with QCM showed that the sublimation activation energy of bulk TNT is 131 kJ/mol. More importantly, all results were obtained at one atmosphere and near room temperature. Thus, it should have direct impacts on explosive trace detection device applications. (C) 2003 Elsevier Science B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25128 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Mu R.,Ueda A.,Liu Y. C.,et al. Effects of interfacial interaction potential on the sublimation rates of TNT films on a silica surface examined by QCM and AFM techniques[J]. Surface Science,2003,530(1—2):L293-L296. |
APA | Mu R..,Ueda A..,Liu Y. C..,Wu M..,Henderson D. O..,...&Chamberlain R. T..(2003).Effects of interfacial interaction potential on the sublimation rates of TNT films on a silica surface examined by QCM and AFM techniques.Surface Science,530(1—2),L293-L296. |
MLA | Mu R.,et al."Effects of interfacial interaction potential on the sublimation rates of TNT films on a silica surface examined by QCM and AFM techniques".Surface Science 530.1—2(2003):L293-L296. |
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