Effects of thermal annealing on ZnO films grown by plasma enhanced chemical vapour deposition from Zn(C2H5)(2) and CO2 gas mixtures

	Effects of thermal annealing on ZnO films grown by plasma enhanced chemical vapour deposition from Zn(C2H5)(2) and CO2 gas mixtures
其他题名	论文其他题名
	Zhi Z. Z.; Liu Y. C.; Li B. S.; Zhang X. T.; Lu Y. M.; Shen D. Z.; Fan X. W.
	2003
发表期刊	Journal of Physics D-Applied Physics
ISSN	0022-3727
卷号	36 期号:6 页码:719-722
摘要	To improve ZnO thin film quality, the ZnO thin films grown on silicon (100) by plasma enhanced chemical vapour deposition from Zn(C2H5)(2) and CO2 gas mixtures at a low temperature of 120degreesC are annealed in an oxygen ambient at temperature ranging from 600degreesC to 1000degreesC. X-ray diffraction spectra indicate that ZnO films possess a polycrystalline hexagonal wurtzite structure. Atomic force microscopy results show an increase of ZnO grain size with the increase of annealing temperature. The photoluminescence is closely related to the annealing temperature. The free exciton binding energy deduced from the temperature-dependent PL spectra is about 59 meV for the ZnO film annealed at 900degreesC, suggesting that the film quality can be improved by annealing process.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25125
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Zhi Z. Z.,Liu Y. C.,Li B. S.,et al. Effects of thermal annealing on ZnO films grown by plasma enhanced chemical vapour deposition from Zn(C2H5)(2) and CO2 gas mixtures[J]. Journal of Physics D-Applied Physics,2003,36(6):719-722.
APA	Zhi Z. Z..,Liu Y. C..,Li B. S..,Zhang X. T..,Lu Y. M..,...&Fan X. W..(2003).Effects of thermal annealing on ZnO films grown by plasma enhanced chemical vapour deposition from Zn(C2H5)(2) and CO2 gas mixtures.Journal of Physics D-Applied Physics,36(6),719-722.
MLA	Zhi Z. Z.,et al."Effects of thermal annealing on ZnO films grown by plasma enhanced chemical vapour deposition from Zn(C2H5)(2) and CO2 gas mixtures".Journal of Physics D-Applied Physics 36.6(2003):719-722.

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